NSUF 11-301: Effect of Heavy Ion Bombardment on UO2 thin films under various conditions of irradiation dose, temperature and actinide surrogates

Our goal is to characterize the physical properties of thin film samples of both doped and undoped UO2, as well as UO2 with a uniform distribution of the plutonium/actinide surrogate material Nd. We will accomplish this by using x-ray absorption spectroscopy (XAS) at the Advanced Photon Source. The samples will be fabricated such that their range of irradiation doses and temperatures match the expected environment in the next generation nuclear reactors, and thus, can potentially provide a model for the behavior of UO2 in generation IV reactors. Also, the Nd under heavy ion bombardment can provide a model for fission fragmentation of these materials in the next generation reactor environment. Samples of UO2, UO2 + x, UO2 – x, U3O8 and UO2 with a uniform distribution of the surrogate material Nd were deposited via sputtering on to Al2O3 substrates. These samples were then analyzed with XRD, RBS and XPS to ensure the structure and stoichiometry of each film. The first batch of samples was irradiated at a range of doses equivalent to that of FIMA, which models the target values of burn up in the next generation reactor designs. The next batch of samples was irradiated at a constant dose but with varying temperatures, specifically from room temperature to 950 C. Finally, samples with uniform distribution of Nd on roughly 20% of the film (U0.8Nd0.2O2) were irradiated at the FIMA target dose values. In conclusion, we seek to characterize the local environment of these various thin film samples using x- ray absorption spectroscopy. The variety of samples and flexibility in sample preparation will allow us to model structural changes in UO2 that may occur in the expected environmental conditions of the next generation nuclear reactors.

Additional Info

Field	Value
Abstract	Our goal is to characterize the physical properties of thin film samples of both doped and undoped UO2, as well as UO2 with a uniform distribution of the plutonium/actinide surrogate material Nd. We will accomplish this by using x-ray absorption spectroscopy (XAS) at the Advanced Photon Source. The samples will be fabricated such that their range of irradiation doses and temperatures match the expected environment in the next generation nuclear reactors, and thus, can potentially provide a model for the behavior of UO2 in generation IV reactors. Also, the Nd under heavy ion bombardment can provide a model for fission fragmentation of these materials in the next generation reactor environment. Samples of UO2, UO2 + x, UO2 – x, U3O8 and UO2 with a uniform distribution of the surrogate material Nd were deposited via sputtering on to Al2O3 substrates. These samples were then analyzed with XRD, RBS and XPS to ensure the structure and stoichiometry of each film. The first batch of samples was irradiated at a range of doses equivalent to that of FIMA, which models the target values of burn up in the next generation reactor designs. The next batch of samples was irradiated at a constant dose but with varying temperatures, specifically from room temperature to 950 C. Finally, samples with uniform distribution of Nd on roughly 20% of the film (U0.8Nd0.2O2) were irradiated at the FIMA target dose values. In conclusion, we seek to characterize the local environment of these various thin film samples using x- ray absorption spectroscopy. The variety of samples and flexibility in sample preparation will allow us to model structural changes in UO2 that may occur in the expected environmental conditions of the next generation nuclear reactors.
Award Announced Date	2011-08-18T00:00:00
Awarded Institution	None
Facility	None
Facility Tech Lead	Jeff Terry
Irradiation Facility	None
PI	Brent Heuser
PI Email	[email protected]
Project Type	APS
RTE Number	301